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SECURITIES AND EXCHANGE COMMISSION
WASHINGTON, D.C. 20549
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FORM 8-K
CURRENT REPORT
PURSUANT TO SECTION 13 OR 15(d)
OF THE SECURITIES EXCHANGE ACT OF 1934
Date of Report (Date of earliest event reported): June 10, 1997
DUPONT PHOTOMASKS, INC.
(Exact name of registrant as specified in its charter)
DELAWARE
(State or Other Jurisdiction of Incorporation)
0-20839 74-2238819
(Commission File Number) (I.R.S. Employer Identification No.)
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100 TEXAS AVENUE
ROUND ROCK, TEXAS 78664
(Address of principal executive offices, including zip code)
512-310-6559
(Registrant's telephone number, including area code)
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5. Other Events.
On June 10, 1997, DuPont Photomasks Inc. (the "Company") announced plans to
build a new photomask facility to be located in the Portland, Oregon area of
the United States. A site search will begin immediately. The facility will be
the Company's fourth photomask production site in the United States and will be
the ninth photomask production site in the Company's international network.
The new production facility will be used to support the Company's customer
base with photomasks to fabricate semiconductor devices with .35 micron and
below design rules. Over 15 wafer fabrication facilities are, or will be,
situated within close proximity to Portland, and the new plant will be
structured to support the diverse needs of the area's semiconductor
manufacturers.
The facility will produce photomasks utilizing the advanced phase shift and
optical proximity correction technologies that are required to fabricate
semiconductor devices with deep sub-micron feature sizes. Production lines at
the plant will be capable of producing photomasks for use in the i-line wafer
steppers that are currently widely deployed as well as excimer-laser steppers
that operate with deep-ultraviolet (DUV) lithography technology.
The Company plans to invest approximately $75 million in the site over the
next four years. The facility will occupy 55,000 square feet and will employ
up to 250 people at full operation. The plant is targeted to begin
operations near the end of 1998.
DuPont Photomask Inc. is the world's leading supplier of photomasks, operating
globally from nine strategically located facilities in North America, Europe,
and Asia. The company produces and supplies photomasks as well as photoblanks
(photomask substrates) and pellicles (protective covers for photomasks).
The discussion in this document contains analysis or trends and other forward
looking statements within the meaning of Section 27A of the Securities Act of
1933, as amended, and Section 21E of the Securities Exchange Act of 1934, as
amended. These statements involve management assumptions and are
subject to risks and uncertainties, including the risk factors set forth
below which are fully described in the Company's Annual Report on Form 10-K
in "Business - Risk Factors" pages 10 to 13: (i) capital intensive industry,
(ii) rapid technological change, (iii) relationship with and dependence on
semiconductor industry, (iv) concentration of customers, (v) concentration of
and dependence on suppliers, (vi) competition; reversal of consolidation
trend, (vii) significant international operations, (viii) dependence on
management and technical personnel, (ix) control by and relationship with
DuPont, (x) no independent operating history prior to the IPO,
(xi) intellectual property, (xii) fluctuations in quarterly and annual
earnings and (xiii) changes in governmental laws and regulations.
Pursuant to the requirements of the Securities Exchange Act of 1934, the
registrant has duly caused this report to be signed on its behalf by the
undersigned, thereunto duly authorized.
DuPont Photomasks, Inc.
By: /s/John M. Lynn
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John M. Lynn,
Executive Vice President,
General Counsel and Secretary
DATE: June 16, 1997
