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SECURITIES AND EXCHANGE COMMISSION
WASHINGTON, D.C. 20549
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FORM 8-K
CURRENT REPORT
PURSUANT TO SECTION 13 OR 15(d) OF
THE SECURITIES EXCHANGE ACT OF 1934
DATE OF REPORT (DATE OF EARLIEST EVENT REPORTED): OCTOBER 2, 1996
DUPONT PHOTOMASKS, INC.
(EXACT NAME OF REGISTRANT AS SPECIFIED IN ITS CHARTER)
DELAWARE
(STATE OR OTHER JURISDICTION OF INCORPORATION)
0-20839 74-2238819
(COMMISSION FILE NUMBER) (IRS EMPLOYER IDENTIFICATION NO.)
100 TEXAS AVENUE
ROUND ROCK, TEXAS 78664
(ADDRESS OF PRINCIPAL EXECUTIVE OFFICE, INCLUDING ZIP CODE)
(512) 388-8859
(REGISTRANT'S TELEPHONE NUMBER, INCLUDING AREA CODE)
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ITEM 5. OTHER EVENTS.
On October 2, 1996, DuPont Photomasks, Inc. (the "Company" or the "registrant")
announced a technology venture for advanced photomask technology development and
pilot line fabrication of leading-edge photomasks among the Company and three
semiconductor manufacturers: Advanced Micro Devices, Inc., Micron Technology,
Inc. and Motorola, Inc.
The venture, a limited liability company called the DPI Reticle Technology
Center ("RTC"), will build, equip and operate a free-standing facility next to
the existing photomask plant that the Company operates in Round Rock, Texas. It
is estimated that the cost of building and equipping the RTC facility will be
approximately $40 million. Paul Chipman, currently the Company's vice president
of technology, will be the general manager of the RTC, which is expected to
begin operations in the second quarter of 1997.
The RTC will focus on deep sub-micron (below 0.35 micron) design rules for
photomasks, as well as multiple types of phase shift masks, and masks with
aggressive optical proximity correction features. The RTC facility will contain
5,500 square feet of clean room space housed in a 17,000 square foot building.
Based on worldwide sales, DuPont Photomasks, Inc. is the world's leading
supplier of photomasks. Operating globally from eight facilities in North
America, Europe and Asia, the Company produces and supplies photomasks as well
as photoblanks (photomask substrates) and pellicles (protective covers for
masks).
Pursuant to the requirements of the Securities Exchange Act of 1934, the
registrant has duly caused this report to be signed on its behalf by the
undersigned, thereunto duly authorized.
DuPont Photomasks, Inc.
By: /s/ Van H. Leichliter
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Van H. Leichliter,
Executive Vice President,
General Counsel and Secretary
DATE: October 4, 1996
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